Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films-Reference-Cited by-同舟云学术

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Published:2018-09 Issue:5 Volume:36 Page:051508
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Sippola Perttu¹,Pyymaki Perros Alexander¹²,Ylivaara Oili M. E.³,Ronkainen Helena³,Julin Jaakko⁴⁵,Liu Xuwen⁶,Sajavaara Timo⁴,Etula Jarkko⁷,Lipsanen Harri¹,Puurunen Riikka L.³⁶

Affiliation:

1. Department of Electronics and Nanoengineering, Aalto University School of Electrical Engineering, P.O. Box 13500, FI-00076 Aalto, Finland

2. Nanovate Oy, Tietotie 3, 02150 Espoo, Finland

3. VTT Technical Research Center of Finland Ltd., P.O. Box 1000, FI-02044 Espoo, Finland

4. Department of Physics, University of Jyväskylä, P.O. Box 35, FI-40014 Jyväskylä, Finland

5. Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, 01328 Dresden, Germany

6. Department of Chemical and Metallurgical Engineering, Aalto University School of Chemical Engineering, P.O. Box 16100, FI-00076 Aalto, Finland

7. Department of Chemistry and Materials Science, Aalto University School of Chemical Engineering, P.O. Box 16100, FI-00076 Aalto, Finland

Funder

Tekes

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5038856

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