Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls-Reference-Cited by-同舟云学术

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Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls

Published:2021-05 Issue:3 Volume:39 Page:032403
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Österlund Elmeri¹^ORCID,Seppänen Heli²^ORCID,Bespalova Kristina¹^ORCID,Miikkulainen Ville³^ORCID,Paulasto-Kröckel Mervi¹^ORCID

Affiliation:

1. Department of Electrical Engineering and Automation, Aalto University, PO Box 13500, 00076 Aalto, Finland

2. Department of Electronics and Nanoengineering, Aalto University, PO Box 13500, FI-00076 Aalto, Finland

3. Department of Chemistry and Materials Science, Aalto University, P.O. Box 16100, FI-00076 Aalto, Finland

Funder

European Space Agency

Sähkötekniikan Korkeakoulu, Aalto-yliopisto

Walter Ahlströmin Säätiö

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000724

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition of highly crystalline AlScN thin films using synchronized high-power impulse magnetron sputtering: From combinatorial screening to piezoelectric devices;Physical Review Materials;2024-09-13

2. Scaling of piezoelectric in-plane NEMS: Towards nanoscale integration of AlN-based transducer on vertical sidewalls;Materials & Design;2024-08

3. Wetting behavior of stainless-steel surface with zinc oxide nanorod coatings: modulations in nanorod alignment through atomic layer deposition;Nanotechnology;2024-06-07

4. Development of calculation model for designing temperature characteristics of double-layered thickness-shear resonator;Japanese Journal of Applied Physics;2024-02-15

5. Improving the structural performance of low-temperature sputtered AlN on silicon substrate;Semiconductor Science and Technology;2024-02-13

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