Measurement of the amount of oxygen generated by quartz source walls in a SF6 dense plasma: Application to a helicon reactor
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.579616
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3. Influence of the reactor wall composition on radicals’ densities and total pressure in Cl2 inductively coupled plasmas: II. During silicon etching;Journal of Applied Physics;2007-11
4. Analysis of the chemical composition and deposition mechanism of the SiO[sub x]–Cl[sub y] layer on the plasma chamber walls during silicon gate etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2004
5. Novel Plasma Approach for the Synthesis of Highly Fluorinated Thin Surface Layers;Langmuir;2002-10-30
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