Soluble site density model for negative and positive chemically amplified resists
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution;European Polymer Journal;2010-10
2. Nanofabrication of super-high-aspect-ratio structures in hydrogen silsesquioxane from direct-write e-beam lithography and hot development;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11
3. Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11
4. A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography;Advances in Resist Materials and Processing Technology XXV;2008-03-14
5. Nanoscale resist morphologies of dense gratings using electron-beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
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