Accuracy requirements for adjusting variable‐shaped beam systems for the production of submicron patterns
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Link
http://avs.scitation.org/doi/pdf/10.1116/1.570281
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Seamless long line and space pattern fabrication for nanoimprint mold by using electron beam stepper;Microelectronic Engineering;2011-08
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3. 50 years of electron beam lithography: Contributions from Jena (Germany);Microelectronic Engineering;2009-04
4. Advantageous Exposure of X Architecture Patterns when Using a Variable-Shaped Beam Tool;Japanese Journal of Applied Physics;2004-06-29
5. Electron optical column for high‐speed electron beam delineator: VL‐R2;Journal of Vacuum Science and Technology;1982-09
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