Seamless long line and space pattern fabrication for nanoimprint mold by using electron beam stepper-Reference-Cited by-同舟云学术

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Seamless long line and space pattern fabrication for nanoimprint mold by using electron beam stepper

Published:2011-08 Issue:8 Volume:88 Page:2074-2078
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Okada Makoto,Kishiro Takafumi,Ataka Masashi,Anazawa Norimichi,Matsui Shinji

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Imprint Lithography with 25-Nanometer Resolution

2. Sub-10 nm imprint lithography and applications

3. Nanowire fin field effect transistors via UV-based nanoimprint lithography

4. S. Yoshitake, H. Sunaoshi, K. Yasui, H. Kobayashi, T. Sato, O. Nagarekawa, E. Thompson, G. Schmid, J. Resnick, Photomask Technology 2007 (Proceedings Volume) Proceedings of SPIE, 6730 (2007) 67300E.

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