Comparison of a new photoresist (DiaPlate 133) with SU-8 using both x-ray and ion beam lithographies-Reference-Cited by-同舟云学术

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Comparison of a new photoresist (DiaPlate 133) with SU-8 using both x-ray and ion beam lithographies

Published:2004 Issue:4 Volume:22 Page:1982
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Gonin Yvan,Munnik Frans,Benninger Frédéric,Dias Francisco,Mikhaı̈lov Sergueı̈

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resist materials for proton beam writing: A review;Applied Surface Science;2014-08

2. Resist evaluation for proton beam writing, Ni mold fabrication and nano-replication;Microsystem Technologies;2014-01-22

3. Proton-Radiation Tolerance of Silicon and SU-8 as Structural Materials for High-Reliability MEMS;Journal of Microelectromechanical Systems;2013-12

4. Proton Beam Writing: A New 3D Nanolithographic Technique;Ion Beams in Nanoscience and Technology;2009

5. Exposure parameters in proton beam writing for hydrogen silsesquioxane;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2008-04

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