Author:
Wang Y. H.,Malar P.,van Kan J. A.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference37 articles.
1. Adesida I (1985) Fine line lithography using ion beams. Nucl Instrum Methods Phys Res B 7–8:923–928
2. Ansari K, van Kan JA, Bettiol AA, Watt F (2004) Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing. Appl Phys Lett 85:476–478
3. Biersack J, Haggmark LG (1980) A Monte Carlo computer program for the transport of energetic ions in amorphous targets. Nucl Instrum Methods 174:257–269
4. Brenner KH, Frank M, Kufner M, Kufner S (1990) H+ lithography for 3-D integration of optical circuits, Appl Opt 29(26)
5. Dhima K, Steinberg C, Möllenbeck S, Mayer A, Scheer HC (2011) Thermal nanoimprint (T-NIL) with photoresists for hybrid lithography. Proc SPIE 7985:798506-1
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献