Oxidation of TiN in an oxygen plasma asher
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.579191
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The effect of oxygen plasma ashing on the resistance of TiN bottom electrode for phase change memory;Journal of Semiconductors;2015-05
2. Downstream Plasma Technology for Cleaning TEM Samples on Carbon Films;Microscopy Today;2014-01
3. Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH[sub 3] Plasma;Journal of The Electrochemical Society;2011
4. Scanning Auger of a specific via interface in an integrated circuit using a novel focused ion beam sample preparation technique;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-07
5. PEALD of a Ruthenium Adhesion Layer for Copper Interconnects;Journal of The Electrochemical Society;2004
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