1. Nano - Precision Systems for Overlay in Advanced Lithography Processes;Proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing;2019
2. A simple and compact synchrotron radiation x‐ray exposure system in a vacuum for ultrafine pattern fabrication;Review of Scientific Instruments;1995-12
3. Fabrication of 0.2 μm large scale integrated circuits using synchrotron radiation x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11
4. Evaluation of a Solid State Detector for X-Ray Lithography Dosimetry;Japanese Journal of Applied Physics;1994-12-30
5. Operating experience with the Helios compact storage ring at IBM;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08