Atomic layer deposition of InN using trimethylindium and ammonia plasma-Reference-Cited by-同舟云学术

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Atomic layer deposition of InN using trimethylindium and ammonia plasma

Published:2019-03 Issue:2 Volume:37 Page:020926
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Deminskyi Petro¹^ORCID,Rouf Polla¹^ORCID,Ivanov Ivan G.¹,Pedersen Henrik¹^ORCID

Affiliation:

1. Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden

Funder

Swedish Research Council Vatenskapsrådet

Knut och Alice Wallenbergs Stiftelse

Carl Tryggers Stiftelse för Vetenskaplig Forskning

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5079279

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorption characteristics of Ni cluster Modified-InN monolayer for indoor noxious gases (CH2O, C6H6, and NH3);Materials Science in Semiconductor Processing;2024-08

2. Trimetallic Ni_xCo_yAl_z LDH-Modified g-C₃N₄ with Influential Effects of M²⁺/M³⁺ (Ni/Co) Active Centers for Stimulating Photocatalytic Hydrogen Production;ACS Applied Energy Materials;2024-07-30

3. Comparison of aluminum nitride thin films prepared by magnetron sputter epitaxy in nitrogen and ammonia atmosphere;Applied Physics Letters;2024-04-29

4. Indium nanocubes based recyclable fluorescent chemosensor for sustainable environmental monitoring: pH-induced fluorescence transition and selective detection of Pd(II) ions;Science of The Total Environment;2024-04

5. Surface chemistry in atomic layer deposition of AlN thin films from Al(CH₃)₃ and NH₃ studied by mass spectrometry;Journal of Materials Chemistry C;2024

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