Sub-100 nm lithography using ultrashort wavelength of surface plasmons-Reference-Cited by-同舟云学术

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Sub-100 nm lithography using ultrashort wavelength of surface plasmons

Published:2004 Issue:6 Volume:22 Page:3475
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Srituravanich W.,Fang N.,Durant S.,Ambati M.,Sun C.,Zhang X.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 43 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Genetic algorithm optimization of grating coupled near-field interference lithography systems at extreme numerical apertures;Journal of Optics;2017-07-26

5. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review;Micromachines;2016-07-13

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