Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review-Reference-Cited by-同舟云学术

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Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

Published:2016-07-13 Issue:7 Volume:7 Page:118
ISSN:2072-666X
Container-title:Micromachines
language:en
Short-container-title:Micromachines

Author:

Wang Changtao,Zhang Wei,Zhao Zeyu,Wang Yanqin,Gao Ping,Luo Yunfei,Luo Xiangang

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering

Link

http://www.mdpi.com/2072-666X/7/7/118/pdf

Reference117 articles.

1. International Technology Roadmap for Semiconductors,2009

2. Lithography gets extreme

3. Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

4. Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

5. Structural and functional analysis of nanopillar spin electronic devices fabricated by 3D focused ion beam lithography

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