Genetic algorithm optimization of grating coupled near-field interference lithography systems at extreme numerical apertures
Author:
Funder
Marsden Fund of New Zealand
Publisher
IOP Publishing
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Link
http://iopscience.iop.org/article/10.1088/2040-8986/aa7c7d/pdf
Reference45 articles.
1. Why optical lithography will live forever
2. ICCAD Roundtable The Many Challenges of Triple Patterning [ICCAD Roundtable]
3. Making lithography work for the 7-nm node and beyond in overlay accuracy, resolution, defect, and cost
4. High index 193 nm immersion lithography: the beginning or the end of the road
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Source and mask optimization for stability of reticle and wafer stages;Optics Express;2024-09-03
2. Sampling-based imaging model for fast source and mask optimization in immersion lithography;Applied Optics;2022-01-05
3. Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography;EPL (Europhysics Letters);2021-10-05
4. Broadband Spin-Dependent Directional Coupler via Single Optimized Metallic Catenary Antenna;Materials;2021-01-10
5. Extraordinary Young’s Interferences and Super-Diffraction Laser Lithography;Handbook of Laser Micro- and Nano-Engineering;2021
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3