Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication-Reference-Cited by-同舟云学术

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Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

Published:2019-12 Issue:6 Volume:37 Page:061306
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Staaks Daniel¹²^ORCID,Yu Zhaoning³,Dhuey Scott D.¹,Sassolini Simone¹,Lee Kim Y.³,Rangelow Ivo W.²^ORCID,Olynick Deirdre L.¹

Affiliation:

1. Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720

2. Department of Micro- and Nanoelectronic Systems, Ilmenau University of Technology, Ilmenau 98684, Germany

3. Seagate Technology LLC, Fremont Research Center, Fremont, California 94538

Funder

EU contract - Single Nanometer Manufacturing for beyond CMOS devices

U.S. Department of Energy

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5123397

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoimprint lithography guiding templates for advanced magnetic media fabrication;Journal of Vacuum Science & Technology B;2024-01-01

2. Versatilely tuned vertical silicon nanowire arrays by cryogenic reactive ion etching as a lithium-ion battery anode;Scientific Reports;2021-10-05

3. Effect of annealing on the structural, optical and surface properties of chromium oxide (Cr2O3) thin films deposited by e-beam evaporation for plasma etching applications;Journal of Alloys and Compounds;2021-09

4. Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma;Plasma Sources Science and Technology;2021-09-01

5. Cr and CrOx etching using SF6 and O2 plasma;Journal of Vacuum Science & Technology B;2021-05

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