Cr and CrOx etching using SF6 and O2 plasma-Reference-Cited by-同舟云学术

Cr and CrOx etching using SF6 and O2 plasma

Published:2021-05 Issue:3 Volume:39 Page:032201
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Hoang Nguyen Vy Thi¹^ORCID,Jensen Flemming¹,Hübner Jörg¹,Shkondin Evgeniy¹^ORCID,Cork Roy¹,Ma Kechun²,Leussink Pele³,De Malsche Wim⁴,Jansen Henri¹

Affiliation:

1. DTU Nanolab, Technical University of Denmark, 2800 Kgs. Lyngby, Denmark

2. MicroCreate B.V., 7535 CH Enschede, Netherlands

3. Mesa+ Nanolab, University of Twente, 7522 NB Enschede, Netherlands

4. μflow Group, Vrije Universiteit Brussel, Pleinlaan 2, Brussels 1050, Belgium

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000922

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