Characteristics of nano electron source fabricated using beam assisted process
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Tertiary electrons in single-event time-of-flight Rutherford backscattering spectrometry;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-10
2. Mechanism-based design of precursors for focused electron beam-induced deposition;MRS Communications;2018-04-26
3. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID);ACS Applied Nano Materials;2018-02-14
4. Improvement of depth resolution and detection efficiency by control of secondary-electrons in single-event three-dimensional time-of-flight Rutherford backscattering spectrometry;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-04
5. Nano electron source fabricated by beam-induced deposition and its unique feature;Microelectronic Engineering;2015-01
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