Electron-cyclotron-resonance plasma etching of the ZnO layers grown by molecular-beam epitaxy-Reference-Cited by-同舟云学术

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Electron-cyclotron-resonance plasma etching of the ZnO layers grown by molecular-beam epitaxy

Published:2004 Issue:3 Volume:22 Page:531
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Ogata K.,Honden T.,Tanite T.,Komuro T.,Koike K.,Sasa S.,Inoue M.,Yano M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Zinc oxide-based biosensors;physica status solidi (c);2012-05-14

2. Microwave performance of ZnO/ZnMgO heterostructure field effect transistors;physica status solidi (a);2010-10-20

3. Etching Characteristics of ZnO and Al-Doped ZnO in Inductively Coupled Cl2/CH4/H2/Ar and BCl3/CH4/H2/Ar Plasmas;Japanese Journal of Applied Physics;2008-08-22

4. High-field characteristics of ZnO and ZnO/ZnMgO heterostructures;physica status solidi (c);2008-01

5. Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films;Applied Surface Science;2007-09

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