Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films-Reference-Cited by-同舟云学术

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Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films

Published:2007-09 Issue:23 Volume:253 Page:9228-9233
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lim W.T.,Stafford L.,Wright J.S.,Vossa L.F.,Khanna R.,Song Ju-Il,Park Jae-Soung,Heo Young Woo,Lee Joon-Hyung,Kim Jeong-Joo,Norton D.P.,Pearton S.J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference47 articles.

1. Optical and structural analysis of ZnCdO layers grown by metalorganic vapor-phase epitaxy

2. Monolithic multichannel ultraviolet detector arrays and continuous phase evolution in MgxZn1−xO composition spreads

3. Recent advances in ZnO materials and devices

4. ZnO spintronics and nanowire devices

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma;Transactions on Electrical and Electronic Materials;2022-08-04

2. Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma;Transactions on Electrical and Electronic Materials;2013-08-25

3. Dry Etching for Micromachining Applications;MEMS Reference Shelf;2011

4. Elucidating surface properties of dry-etched ZnO using H2/CH4 and H2/CH4/Ar plasma;Applied Surface Science;2010-11

5. Phase Development and Electrical Characteristics of n-Type Semiconductive Transparent In₂O₃(ZnO)₂ Ceramics with ZnO/SnO₂ Co-Substitution;Journal of Nanoelectronics and Optoelectronics;2010-08-01

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