Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma
Author:
Funder
Ministry of Education
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s42341-022-00408-6.pdf
Reference32 articles.
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4. Y. Satoh, T. Nishihara, T. Yokoyama, M. Ueda, T. Miyashita: Development of Piezoelectric Thin Film Resonator and Its Impact on Future Wireless Communication Systems, Jpn. J. Appl. Phys. 44, 2883–2894 (2005). Doi: https://doi.org/10.1143/JJAP.44.2883.
5. J. Lee, J.H. Jeon, C.H. Je, Y.G. Kim, S.Q. Lee, W.S. Yang, J.S Lee and S.G Lee: A concave-patterned TiN/PECVD-Si3N4/TiN diaphragm MEMS acoustic sensor based on a polyimide sacrificial layer, J. Micromech. Microeng. 25, 125022 (2015). Doi: https://doi.org/10.1088/0960-1317/25/12/125022
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