Calculation of Deposition Uniformity in rf Sputtering-Reference-Cited by-同舟云学术

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Calculation of Deposition Uniformity in rf Sputtering

Published:1969-09 Issue:5 Volume:6 Page:795-800
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Brodie I.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1492710

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evaluation of heating uniformity in radio frequency heating systems using carrot and radish;International Agrophysics;2016-10-01

2. Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-12

3. Ion Beam Etching Technology for High-Density Spin Transfer Torque Magnetic Random Access Memory;Japanese Journal of Applied Physics;2009-08-20

4. Deposition rate distribution in a rotatable cylindrical cathode system;Thin Solid Films;1992-01

5. Considerations on the design of a dc sputtering system concerning its application to Ta and Si deposition;Vacuum;1990-01

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