Early stage nucleation mechanism for SiC(0001) surface epitaxial growth

Author:

Ai Wensen1ORCID,Chen Xuejiang1ORCID,Feng Jianmei1

Affiliation:

1. School of Energy and Power Engineering, Xi’an Jiaotong University, Xi’an, Shaanxi 710049, People’s Republic of China

Abstract

Due to the complexity of the binary component system and the difficulty of tracing individual particles in experiments, it is highly desirable to develop simulation tools and models to further reveal the microscopic nucleation behavior of Si and C atoms. In this article, self-consistent rate equations (SCRE) theory combined with the Kinetic Monte Carlo (KMC) model are used to study the nucleation mechanism in the early stage of SiC(0001) surface epitaxial growth under a constant deposition flux. A set of rate equations describing the time evolution of the density of monomers, dimers, and islands are established. By introducing the effective absorption length, the rate equations can be solved self-consistently. In the KMC model, a set of crystal lattices of SiC, including the coordinates of individual Si and C particles and the bond indication, are established. In this model, deposition, adatom diffusion, attachment to and detachment from the clusters of Si or C, and their diffusion along the edge of clusters are considered, and the Hoshen–Kopelman algorithm is implemented to identify and label the clusters. The results show that the time evolution of the density of monomers, dimers, and islands and their dependences on the deposition flux, which are obtained from the SCRE theory, are consistent with the results of the KMC model. The nucleation rate of the dimer increases with the increase in the deposition flux until the number of islands becomes saturated, which leads to a higher density of stable clusters at higher flux. Two regimes governing the absorption length of the monomer are presented. First, before the appearance of the nucleus, the absorption length of the monomer is mainly dominated by monomer density and the diffusion coefficient of adatom. Second, with the growth process, the total capture rate of stable islands gradually plays a dominant role, which is responsible for the further reduction in absorption length and the equal absorption length of Si and C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3