Substrate Bombardment During RF Sputtering-Reference-Cited by-同舟云学术

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Substrate Bombardment During RF Sputtering

Published:1969-01 Issue:1 Volume:6 Page:124-127
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Brodie I.,Lamont L. T.,Myers D. O.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1492641

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Amorphous ZnOxNy thin films with high electron Hall mobility exceeding 200 cm2 V−1 s−1;Applied Physics Letters;2016-12-26

2. Особливості впливу умов вирощування на структурні і оптичні властивості плівок Zn0,9Cd0,1O;Ukrainian Journal of Physics;2012-06-30

3. Features of the influence of the deposition power and Ar/O2 gas ratio on the microstructure and optical properties of the Zn0.9Cd0.1O films;Thin Solid Films;2012-05

4. Filling of Deep-sub-µm Through Holes and Trenches by High Vacuum Planar Magnetron Sputter;Electrochemistry;2001-10-05

5. Tailored Ceramic Film Growth at Low Temperature by Reactive Sputter Deposition;Critical Reviews in Solid State and Materials Sciences;1998-09

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