Gas assisted focused electron beam induced etching of alumina-Reference-Cited by-同舟云学术

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Gas assisted focused electron beam induced etching of alumina

Published:2009 Issue:6 Volume:27 Page:2727
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Bret T.,Afra B.,Becker R.,Hofmann Th.,Edinger K.,Liang T.,Hoffmann P.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. SiO₂ etching and surface evolution using combined exposure to CF₄/O₂ remote plasma and electron beam;Journal of Vacuum Science & Technology A;2022-12

2. Enhancing the focused ion beam etch rate of Ag films by Joule heating;Journal of Vacuum Science & Technology B;2018-11

3. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing;Journal of Physics D: Applied Physics;2017-04-13

4. Chlorine based focused electron beam induced etching: A novel way to pattern germanium;Materials Science in Semiconductor Processing;2016-02

5. Inert Gas Enhanced Laser-Assisted Purification of Platinum Electron-Beam-Induced Deposits;ACS Applied Materials & Interfaces;2015-07-14

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