Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology 5600 MB, Eindhoven, The Netherlands
2. Department of Chemical and Environmental Engineering, Universidad Técnica Federico Santa María, Santiago, Chile
Abstract
Funder
HORIZON EUROPE European Research Council
Lam Research
Fondo Nacional de Desarrollo Científico y Tecnológico
NLHPC
Dutch Research Council
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://avs.scitation.org/doi/pdf/10.1116/6.0002096
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