Kinetics of high‐temperature thermal decomposition of SiO2 on Si(100)-Reference-Cited by-同舟云学术

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Kinetics of high‐temperature thermal decomposition of SiO2 on Si(100)

Published:1987-07 Issue:4 Volume:5 Page:1559-1562
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Liehr M.,Lewis J. E.,Rubloff G. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574564

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