Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication-Reference-Cited by-同舟云学术

Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication

Published:2016-03 Issue:2 Volume:34 Page:021602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Liu Hangyu¹,Herrnsdorf Johannes¹,Gu Erdan¹,Dawson Martin D.¹

Affiliation:

1. Department of Physics, Technology and Innovation Centre, Institute of Photonics, University of Strathclyde, 99 George Street, Glasgow G1 1RD, United Kingdom

Funder

China Scholarship Council (CSC)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4943558

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