Monte Carlo simulations of secondary electron emission due to ion beam milling-Reference-Cited by-同舟云学术

Monte Carlo simulations of secondary electron emission due to ion beam milling

Published:2017-07 Issue:4 Volume:35 Page:041805
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Mahady Kyle¹,Tan Shida²,Greenzweig Yuval³,Livengood Richard²,Raveh Amir³,Fowlkes Jason D.⁴,Rack Philip⁴

Affiliation:

1. Department of Materials Science and Engineering, University of Tennessee, 414 Ferris Hall, Knoxville, Tennessee 37996

2. Intel Corporation, Santa Clara, California 95054

3. Intel Israel (74), Ltd., Haifa 31015, Israel

4. Department of Materials Science and Engineering, University of Tennessee, 414 Ferris Hall, Knoxville, Tennessee 37996 and Oak Ridge National Lab, Center for Nanophase Materials Science, Oak Ridge, Tennessee 37830

Funder

Intel Corporation (Intel)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4994801

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