Sub-15 nm nanoimprint molds and pattern transfer-Reference-Cited by-同舟云学术

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Sub-15 nm nanoimprint molds and pattern transfer

Published:2009 Issue:6 Volume:27 Page:2837
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Morecroft Debbie,Yang Joel K. W.,Schuster S.,Berggren Karl K.,Xia Qiangfei,Wu Wei,Williams R. Stanley

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 44 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of Self-aligned Quadruple Patterning to Fabrication of Nanoimprint Mold with Sub-12-nm Half-pitch;Journal of Photopolymer Science and Technology;2024-06-25

2. Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process;Japanese Journal of Applied Physics;2024-02-20

3. Deformation Mechanism of Aluminum, Copper, and Gold in Nanoimprint Lithography Using Molecular Dynamics Simulation;Nanomaterials;2023-12-08

4. Electron beam lithography and dimensional metrology for fin and nanowire devices on Ge, SiGe and GeOI substrates;Microelectronic Engineering;2023-08

5. Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures;Nanoscale;2020

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