Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures-Reference-Cited by-同舟云学术

Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Published:2020 Issue:19 Volume:12 Page:10584-10591
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Tan You Sin¹²^ORCID,Liu Hailong¹²,Ruan Qifeng¹²,Wang Hao¹²^ORCID,Yang Joel K. W.¹²³⁴⁵

Affiliation:

1. Singapore University of Technology and Design

2. Singapore

3. Institute of Materials Research and Engineering

4. A*STAR (Agency for Science

5. Technology and Research)

Abstract

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

Funder

National Research Foundation Singapore

Digital Manufacturing and Design Centre, Singapore University of Technology and Design

SUTD-MIT International Design Centre

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/D0NR01032D

Reference33 articles.

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