Full-field exposure performance of electron projection lithography tool-Reference-Cited by-同舟云学术

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Full-field exposure performance of electron projection lithography tool

Published:2004 Issue:6 Volume:22 Page:2885
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Suzuki Kazuaki,Hirayanagi Noriyuki,Fujiwara Tomoharu,Yamada Atsushi,Ikeda Junji,Yahiro Takehisa,Kojima Shinichi,Udagawa Jin,Yamamoto Hajime,Katakura Norihiro,Suzuki Motoko,Aoyama Takashi,Takekoshi Hidekazu,Umemoto Takaaki,Shimizu Hiroyasu,Fukui Saori,Suzuki Shohei,Okino Teruaki,Ohkubo Yukiharu,Shimoda Toshimasa,Tanida Toru,Watanabe Yoichi,Kohama Yoshiaki,Ohmori Kaoru,Mori Futoshi,Takemoto Shigeru,Yoshioka Takeshi,Hirose Hiroshi,Morita Kenji,Hada Kazunari,Kawata Shintaro,Kakizaki Yukio,Miura Takaharu

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography, metrology and nanomanufacturing;Nanoscale;2011

2. Simulation of Limited-Area Cathode as Mask-Irradiation Source;Japanese Journal of Applied Physics;2007-11-06

3. Unconventional methods for forming nanopatterns;Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanoengineering and Nanosystems;2006-09-01

4. Resolution improvement of EPL stencil mask using thin membrane;SPIE Proceedings;2006-03-10

5. Influence of Electron Scattering on Resist Pattern Edge Roughness in Low Dose Electron Beam Lithography;Journal of the Society of Materials Science, Japan;2006

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