Uniformity study in large-area showerhead reactors-Reference-Cited by-同舟云学术

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Uniformity study in large-area showerhead reactors

Published:2005-07 Issue:4 Volume:23 Page:927-932
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sobbia R.,Sansonnens L.,Bondkowski J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1868613

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multi-field simulation and optimization of SiNx:H thin-film deposition by large-size tubular LF-PECVD;Solar Energy;2021-11

2. Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor;Coatings;2021-08-23

3. Study on effect of process and structure parameters on SiNxHy growth by in-line PECVD;Solar Energy;2020-03

4. Multi-model simulation of 300 mm silicon-nitride thin-film deposition by PECVD and experimental verification;Surface and Coatings Technology;2016-07

5. 2D fluid model analysis for the effect of 3D gas flow on a capacitively coupled plasma deposition reactor;Plasma Sources Science and Technology;2016-04-06

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