Structure of surface reaction layer of poly-Si etched by fluorocarbon plasma
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.2167972
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Selective Nanoscale Fabrication with Roughness Reduction of Polycrystalline Silicon by Physically Induced Fluorine Bonds Using Atomic Force Microscope;Advanced Engineering Materials;2023-06-15
2. Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation;Japanese Journal of Applied Physics;2017-05-31
3. Chemical analysis techniques for failure analysis;Handbook of Materials Failure Analysis with Case Studies from the Aerospace and Automotive Industries;2016
4. Ion beam experiments for the study of plasma–surface interactions;Journal of Physics D: Applied Physics;2014-05-14
5. Origin of electrical signals for plasma etching endpoint detection;Applied Physics Letters;2011-11-14
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