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Ion beam experiments for the study of plasma–surface interactions

  • Published:2014-05-14 Issue:22 Volume:47 Page:224008
  • ISSN:0022-3727
  • Container-title:Journal of Physics D: Applied Physics
  • language:
  • Short-container-title:J. Phys. D: Appl. Phys.

Author:

Karahashi Kazuhiro,Hamaguchi Satoshi

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 41 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In Plasma ion beam analysis of polymer layer and adsorbed H monolayer etching;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-09

2. Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications;Japanese Journal of Applied Physics;2024-08-01

3. Future of plasma etching for microelectronics: Challenges and opportunities;Journal of Vacuum Science & Technology B;2024-06-07

4. High-throughput SiN ALE: surface reaction and ion-induced damage generation mechanisms;Japanese Journal of Applied Physics;2023-06-08

5. Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces;Journal of Vacuum Science & Technology A;2023-03
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