Investigations of x-ray exposure using plane scanning mirrors-Reference-Cited by-同舟云学术

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Investigations of x-ray exposure using plane scanning mirrors

Published:1983 Issue:4 Volume:1 Page:1271
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Bieber M.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03

2. New exposure method for SR lithography: Combination of scanning mirror and electron beam wobbling;Microelectronic Engineering;1994-01

3. Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography;Japanese Journal of Applied Physics;1993-12-15

4. Performance of a wide-field flux delivery system for synchrotron x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

5. X-ray lithography beamlines in the IBM Advanced Lithography Facility;IBM Journal of Research and Development;1993-05

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