Improvement of Dose Uniformity in Large Exposure Field for Synchrotron Radiation Lithography
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Published:1993-12-15
Issue:Part 1, No. 12A
Volume:32
Page:5801-5804
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Maejima Yukihiko,Awaji Naoki
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering