Stability and composition of Ni–germanosilicided Si[sub 1−x]Ge[sub x] films
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effect of Sn implantation on thermal stability improvement of NiSiGe;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-12
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3. Suppression of Void Formation in Si0.5Ge0.5Alloy Nanowire during Ni Germanosilicidation;Advanced Engineering Materials;2014-03-20
4. High Quality Silicon Cap Layer for 28nm and Beyond PMOS Processes;ECS Transactions;2013-03-15
5. Substrate engineering for Ni-assisted growth of carbon nano-tubes;Materials Science and Engineering: B;2012-10
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