Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry-Reference-Cited by-同舟云学术

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

Published:2010-09 Issue:5 Volume:28 Page:993-1004
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Weilnboeck F.,Bruce R. L.,Engelmann S.,Oehrlein G. S.,Nest D.,Chung T.-Y.,Graves D.,Li M.,Wang D.,Andes C.,Hudson E. A.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3484249

Cited by 46 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching;Journal of Vacuum Science & Technology A;2024-04-10

2. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process;Journal of Vacuum Science & Technology B;2023-10-31

3. Inorganic Fillers and Their Effects on the Properties of Flax/PLA Composites after UV Degradation;Polymers;2023-07-28

4. Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity;Journal of Vacuum Science & Technology A;2021-07

5. Enhanced glycerol dehydration of pervaporation cross‐linked PVA membranes modified by VUV / UV‐C treatments;Journal of Applied Polymer Science;2021-03-17