Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

Published:2020-05 Issue:3 Volume:38 Page:033009
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Hajihoseini Hamidreza¹²^ORCID,Čada Martin³^ORCID,Hubička Zdenek³^ORCID,Ünaldi Selen²,Raadu Michael A.⁴,Brenning Nils⁴⁵,Gudmundsson Jon Tomas¹⁴^ORCID,Lundin Daniel²⁵^ORCID

Affiliation:

1. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland

2. Laboratoire de Physique des Gaz et Plasmas—LPGP, UMR 8578 CNRS, Université Paris-Sud, Université Paris Saclay, 91405 Orsay CEDEX, France

3. Institute of Physics v. v. i., Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic

4. Department of Space and Plasma Physics, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden

5. Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping, Sweden

Funder

Icelandic research fund for doctoral students

Czech Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5145292

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