Design and test of a through-the-mask alignment sensor for a vertical stage x-ray aligner-Reference-Cited by-同舟云学术

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Design and test of a through-the-mask alignment sensor for a vertical stage x-ray aligner

Published:1994-11 Issue:6 Volume:12 Page:3251
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Nelson M.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nano - Precision Systems for Overlay in Advanced Lithography Processes;Proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing;2019

2. Moiré fringe alignment using composite circular-line gratings for proximity lithography;Optics Express;2015-07-31

3. High-resolution proximity lithography for nano-optical components;Microelectronic Engineering;2015-01

4. Mask-substrate alignment via interferometric moiré fringes;Nanolithography;2014

5. Performance of X-Ray Stepper for Next-Generation Lithography;Japanese Journal of Applied Physics;1999-12-30

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