Performance of X-Ray Stepper for Next-Generation Lithography-Reference-Cited by-同舟云学术

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Performance of X-Ray Stepper for Next-Generation Lithography

Published:1999-12-30 Issue:Part 1, No. 12B Volume:38 Page:7059-7064
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Fukuda Makoto,Suzuki Masanori,Haga Tsuneyuki,Takeuchi Nobuyuki,Morita Hirofumi,Deguchi Kimiyoshi,Taguchi Takao,Aoyama Hajime,Mitsui Souichiro,Matsui Yasuji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation of high-aspect-ratio 70-nm patterns by supercritical drying technique in proximity x-ray lithography;Emerging Lithographic Technologies VI;2002-07-05

2. Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists;Japanese Journal of Applied Physics;2002-06-30

3. Up-to-date activities of PXL (proximity x-ray lithography);SPIE Proceedings;2001-09-05

4. Production x-ray lithography stepper for 100-nm device fabrication;SPIE Proceedings;2001-08-20

5. Overlay and critical dimension control in 100-nm ULSI processes using TaBN x-ray masks and the XRA x-ray stepper;SPIE Proceedings;2001-08-20

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