Stochastic defect removal coating for high-performance extreme ultraviolet lithography

Author:

Choi Young Joo1,Namgung Ran2,Kim Jun Soo1,Song Dae Seok2,Park Hyeon2,Bae Shin-hyo2,Chon Min-Ki2,Kim Min Soo2,Song Hyun-Ji1,Kim Hyun-Woo1,Hong Suk Koo1

Affiliation:

1. Material Development Team, Semiconducor R&D Center, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, Republic of Korea

2. Advanced Materials Group, Samsung SDI, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 16678, Republic of Korea

Abstract

To reduce the stochastic defect caused by insufficient photon numbers of extreme ultraviolet lithography, a simple additional process has been designed and experimented. The additional process consists of one coating and washing process after pattern formation by lithography. The coating material was named stochastic defect removal coating and was carefully designed to reduce the stochastic defects without harming the lithographic margin. The defect reduction up to 48% was accomplished by failure-free latitude measurement and defect inspection.

Funder

Samsung Electronics Co., Ltd

Samsung SDI Co., Ltd

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3