Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation-Reference-Cited by-同舟云学术

Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation

Published:2015-09 Issue:5 Volume:33 Page:052203
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Förster Anja¹,Wagner Christian²,Gemming Sibylle³,Schuster Jörg⁴

Affiliation:

1. Fraunhofer ENAS, Technologie-Campus 3, 09126 Chemnitz, Germany and Center for Advancing Electronics Dresden, TU Dresden, 01062 Dresden, Germany

2. Center for Microtechnologies, TU Chemnitz, Reichenhainer Str. 70, 09126 Chemnitz, Germany

3. Department of Physics, TU Chemnitz, Reichenhainer Str. 70, 09126 Chemnitz, Germany; Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstraße 400, 01328 Dresden, Germany; and Center for Advancing Electronics Dresden, TU Dresden, 01062 Dresden, Germany

4. Fraunhofer ENAS, Technologie-Campus 3, 09126 Chemnitz, Germany

Funder

Deutsche Forschungsgemeinschaft (DFG)

Helmholtz Association

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4927564

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