Modeling extreme ultraviolet∕H[sub 2]O oxidation of ruthenium optic coatings
Author:
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Development of a dynamic gas lock inhibited model for EUV-induced carbon deposition;The Journal of Chemical Physics;2024-01-28
2. Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage;Journal of Vacuum Science & Technology A;2022-04-26
3. Predicting radiation-induced carbon contamination of EUV optics;Journal of Vacuum Science & Technology B;2019-03
4. Plasma-assisted oxide removal from ruthenium-coated EUV optics;Journal of Applied Physics;2018-04-21
5. EUV mask defectivity – a process of increasing control toward HVM;Advanced Optical Technologies;2017-01-01
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