Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys-Reference-Cited by-同舟云学术

Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys

Published:2016-01 Issue:1 Volume:34 Page:01A123
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Haider Ali¹,Kizir Seda¹,Ozgit-Akgun Cagla¹,Okyay Ali Kemal²,Biyikli Necmi¹

Affiliation:

1. National Nanotechnology Research Center (UNAM), Bilkent University, Bilkent, Ankara 06800, Turkey and Institute of Materials Science and Nanotechnology, Bilkent University, Bilkent, Ankara 06800, Turkey

2. National Nanotechnology Research Center (UNAM), Bilkent University, Bilkent, Ankara 06800, Turkey; Institute of Materials Science and Nanotechnology, Bilkent University, Bilkent, Ankara 06800, Turkey; and Department of Electrical and Electronics Engineering, Bilkent University, Bilkent, Ankara 06800 Turkey

Funder

Tubitak, Turkey

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4936072

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