Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition-Reference-Cited by-同舟云学术

Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition

Published:2018 Issue:24 Volume:6 Page:6471-6482
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Haider Ali¹²³⁴^ORCID,Deminskyi Petro¹²³⁴,Yilmaz Mehmet¹²³⁴,Elmabruk Kholoud⁵⁶⁷⁸,Yilmaz Ibrahim⁹¹⁰¹¹⁴,Biyikli Necmi¹²¹³¹⁴

Affiliation:

1. UNAM – Institute of Materials Science and Nanotechnology

2. Bilkent University

3. Ankara 06800

4. Turkey

5. Department of Electrical Engineering

6. Aljabal Algharbi University

7. Gharian

8. Libya

9. Turgut Özal University

10. Department of Electrical and Electronics Engineering

11. Etlik-Kecioren

12. University of Connecticut, Department of Electrical and Computer Engineering

13. U-4157 Storrs

14. USA

Abstract

In this work, we demonstrate vertical GaN, AlN, and InN hollow nano-cylindrical arrays (HNCs) grown on Si substrates using anodized aluminum oxide (AAO) membrane templated low-temperature plasma-assisted atomic layer deposition (PA-ALD).

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/TC/C8TC01165F

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