Lifetime measurement of metastable fluorine atoms using electron cyclotron resonance plasma source
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.2357959
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Statistical insights into the reaction of fluorine atoms with silicon;Scientific Reports;2020-08-12
2. Dry etching of SiC using Ar/F2plasma and XeF2plasma;Japanese Journal of Applied Physics;2015-05-11
3. Development of Localized Plasma Etching System for Failure Analyses in Semiconductor Devices: (4)Precise Temperature Measured during Plasma Etching;Journal of the Vacuum Society of Japan;2012
4. Center of Excellence for Atomically Controlled Fabrication Technology;Journal of Nanoscience and Nanotechnology;2011-04-01
5. Feasibility study of in-beam polarization of fluorine;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2007-10
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