Dry etching of SiC using Ar/F2plasma and XeF2plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/54/i=6S2/a=06GB01/pdf
Reference32 articles.
1. Demonstration of two-dimensional photonic crystals based on silicon carbide
2. SiC power diodes provide breakthrough performance for a wide range of applications
3. Single Crystal and Polycrystalline 3C-SiC for MEMS Applications
4. SiC MEMS: opportunities and challenges for applications in harsh environments
5. Comparison of F2 plasma chemistries for deep etching of SiC
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Evaluation of characteristics in VO x microbolometer fabricated by MOD on Si 3 N 4 /SiO 2 membrane;Electronics and Communications in Japan;2019-01-04
2. Evaluation of Characteristics in VOx Microbolometer Fabricated by MOD on Si3N4/SiO2 Membrane;IEEJ Transactions on Fundamentals and Materials;2018-09-01
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