Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation-Reference-Cited by-同舟云学术

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Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Published:2008 Issue:5 Volume:26 Page:1637
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Sumiya M.,Bruce R.,Engelmann S.,Weilnboeck F.,Oehrlein G. S.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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