Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films-Reference-Cited by-同舟云学术

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Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Published:2004-03 Issue:2 Volume:22 Page:260-263
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lee Jung W.,Cuomo Jerome J.,Bourham Mohamed

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1641049

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A fluid model of pulsed direct current planar magnetron discharge;Scientific Reports;2023-06-03

2. A Fluid Model of Pulsed Direct Current Planar Magnetron Discharge;2023-04-03

3. Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties;Applied Surface Science;2021-10

4. Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering;The International Journal of Advanced Manufacturing Technology;2021-04-04

5. Extended x-ray absorption fine structure measurements on asymmetric bipolar pulse direct current magnetron sputtered Ta_2O_5 thin films;Applied Optics;2015-07-24

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